Materials Fabrication

Name of coordinated RTP
Materials Fabrication

Lead scientists
Luke Hankin, LU, luke.hankin@fysik.lu.se

Prof. Vladislav Korenivski, KTH, vk@kth.se

Shared equipment and resources
WISE Materials Fabrication Platform consists of three tools for semiconductor processing; Atomic Layer Depostion (ALD) combined with Chemical Vapor Depostion (CVD) at KTH, hot-wall Metal Organic Chemical Vapour Deposition (MOCVD) in Lund and Deep Reactive Ion Etching (DRIE) also in Lund.

The three instruments cover crucial interlinked aspects for Sweden to be competitive in materials research in the strongly expanding and developing semiconductor arena – which also has a huge impact on sustainability issues. The KTH tools enable growth of 2D materials and more exploratory materials studies. The III-Nitride hot-wall MOCVD is focused on the most important semiconductor material (together with Si) giving the extreme purity and quality of material growth needed to make materials with competitive properties for semiconductor device development and fundamental research. The combination of III-Nitride hot-wall MOCVD and a DRIE at Myfab Lund will enable research into materials and 3D structures aimed at enabling a sustainable society by electrification, energy-saving, and clean energy. ALD and CVD thin film deposition techniques at KTH will be suited for coating 3D structures produced at Lund with a wide range of conformal coatings: these techniques involve reactions of precursor gasses directly on the substrate and are not limited by “line of sight”.

The KTH node is operational and inaugurated. The Lund node is expected to be operational during 2027.

Coordination and access
The three instruments are part of Myfab. Access, including training and booking, is granted through Myfab’s user access routines.