KTH Royal Institute of Technology
Materials Fabrication
Name of RTP
High-field Materials NMR and MRI
Scientist in Charge
Prof. Vladislav Korenivski
vk@kth.se
Points of contact
Dr. Erik Holmgren
eholmgr@kth.se
Status
In full operation since August 2026, inaugurated Sep’18, 2026.
Brief description of RTP
ALD Atomfab PlasmaPro (OxInst)
Plasma-enhanced atomic layer deposition system for high quality materials, such as Ti-N, Nb-N, Al-O, Hf-O, including ultra-thin quantum materials and multilayers, that can be deposited at speed, with flexibility to run multiple chemistries and incorporation into devices:
- high material quality at 3x faster than conventional remote plasma
- reduced precursor consumption, small budget and environmental footprint
- low cost of ownership, improved serviceability and maintenance
- low volume chamber for speed
- low substrate damage
- higher process stability
ICPCVD PlasmaPro (Oxinst)
Chemical vapor deposition system for growing films at low temperature through high-density remote plasma, achieves superior film quality with low substrate damage: Si oxide, nitride, carbide, amorphous Si, variety of other materials possible (via addon modules):
- excellent uniformity, high precision, high throughput
- wide temperature range electrode, capability from -150 to 400 C
- all wafer sizes up to 200 mm, rapid change between sizes
- in-situ chamber cleaning and end-point
- flexible vapor delivery module enables liquid precursors, e.g. TiO2, SiO2
Links to more information and booking
More information, training and booking
See examples of work done at ANL.
Contact
KTH Royal Institute of Technology
Vladislav Korenivski
Professor